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LAM ELECTROSTATIC CHUCK 839-800327-315

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The LAM 839-800327-315 Electrostatic Chuck is a precision-engineered component designed for semiconductor manufacturing processes, ensuring high-quality performance in handling delicate wafers.

Material:High-grade stainless steel

Max Vacuum Compatibility:Ultra-high vacuum

Temperature Range:-20°C to +150°C

Electrostatic Force Adjustment:Variable through electronic control

Operating Pressure:0.1 Torr

Chucking Capacity:50 mm x 50 mm

Vacuum Pump Compatibility:Industry-standard compatible

    Engineered for optimal performance in high-volume semiconductor fabrication lines, our LAM ELECTROSTATIC CHUCK 839-800327-315 ensures unparalleled precision in wafer handling.

    Crafted from high-grade stainless steel, this chuck provides exceptional durability and resistance to corrosion, ensuring longevity in demanding industrial environments.

    Equipped with adjustable electrostatic force capabilities, it allows for fine-tuning to accommodate various wafer sizes and materials, enhancing process efficiency and yield.

    Featuring an expansive temperature range, it maintains stable thermal conditions throughout the manufacturing process, reducing variability and improving product quality.

    Vacuum compatibility up to 10^-4 Torr enables precise control over atmospheric conditions, minimizing contamination and ensuring consistent results across batches.

    Designed with ease of integration in mind, our LAM ELECTROSTATIC CHUCK is compatible with a wide array of semiconductor equipment, facilitating seamless implementation into existing production lines.

LAM 839-800327-315 ELECTROSTATIC CHUCK




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